| AVS 66th International Symposium & Exhibition | |
| Applied Surface Science Division | Monday Sessions |
| Session AS+BI+RA-MoM |
| Session: | Quantitative Surface Analysis I/Reproducibility Issues in Quantitative XPS |
| Presenter: | Andreas Thissen, SPECS Surface Nano Analysis GmbH, Germany |
| Authors: | A. Thissen, SPECS Surface Nano Analysis GmbH, Germany P. Dietrich, SPECS Surface Nano Analysis GmbH, Germany W.E.S. Unger, Bundesanstalt für Materialforschung und -prüfung - Berlin (Germany), Germany |
| Correspondent: | Click to Email |
Over the last fifty years significant developments have been done in photoelectron spectroscopy instrumentation and thus opened new fields of application. Especially XPS or ESCA developed into a standard analytical method in many labs for surface and material characterization. The number of users and the number of publications using XPS data has tremendously increased. But as a side effect it is a challenge to keep the level of knowledge about the method and correct data interpretation at a high level for all users of these data.
To avoid errors in the interpretation of XPS data instrument manufacturers put efforts inside their instruments and software packages to help and guide the user through data acquisition, data quantification and interpretation and finally also through data reporting. By this data can be made compatible with existing ISO and other community standards. But even more, data quality becomes transparent also in times of open source publications and open data repositories.
This paper summarizes the challenges of data handling, data treatment, data storage, parameter-data correlation, expert systems for data acquisition, reporting assistance and tracking and authorization tools for sensitive data. In summary future perspectives and suggestions are discusses for improved data repeatability and data reliability.