| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Friday Sessions |
| Session TF-FrM |
| Session: | Theory and Characterization of Thin Film Properties |
| Presenter: | Noel O’Toole, Kurt J. Lesker Company |
| Authors: | N. O’Toole, Kurt J. Lesker Company G.B. Rayner, Jr., Kurt J. Lesker Company N.A. Strnad, General Technical Services, LLC D.M. Potrepka, U.S. Army Research Laboratory |
| Correspondent: | Click to Email |
Ultra-high purity (UHP) process capability is motivated by the need to produce superior, high-quality thin films and interfaces by atomic layer deposition (ALD) techniques. In particular, UHP equipment design reduces background impurity levels, including oxygen, to limit incorporation during film growth. Creating and maintaining a UHP process environment are also essential for ALD process reproducibility. This presentation will address the potential sources of background contamination, as well as system design requirements to obtain a controlled UHP process environment. Results will be presented that demonstrate the effectiveness of this technology to obtain high-quality titanium nitride thin films by plasma-enhanced ALD (PEALD) techniques.