| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
| Session PS-TuP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | Jung-Hyung Kim, Korea Research Institute of Standards and Science, Republic of Korea |
| Authors: | J.H. Kim, Korea Research Institute of Standards and Science, Republic of Korea H.C. Lee, Korea Research Institute of Standards and Science, Republic of Korea D.J. Seong, Korea Research Institute of Standards and Science, Republic of Korea |
| Correspondent: | Click to Email |
We developed high density plasmas in a very uniform magnetic field. To maximize the electron density and efficiency, aspect ratio of discharge cylinder is varied. The discharge pressure is about mTorr or sub-mTorr. Characterization of fully ionized high density helicon plasma is made with probes and optical emission spectra. A helicon plasma with 1013 cm−3 density is produced in a diameter of 10 cm and length of 70 cm, and the preliminary results of plasma properties are briefly described. The electron temperature is relatively high and the ions are highly ionized. These low pressure plasmas emit short wavelength lights. We inject Xe gas and/or Sn in this system to see the possibility for EUV light sources as one of applications. Weak EUV emission can be detected in low pressure high density magnetized plasma with Sn injection. We could see the possibility for EUV source with this magnetized plasma system. Hereafter, we need more RF power and higher magnetic field to more confine the high density plasma column. We need also to stabilize the plasma for stable strong EUV source at low pressure and high magnetic field.