Paper PS-TuP19
Plasma Etching High Aspect Ratio Carbon Nanotube Structures for a Neural Probe

Tuesday, October 22, 2019, 6:30 pm, Room Union Station B

A new approach to neural probe arrays using Carbon Nanotube Templated Microfabrication produces probes that would be smaller and more compliant than existing technologies. To achieve tall, straight probes, a sacrificial hedge is grown connecting adjacent probes and then is removed with a series of plasma etching conditions. These etches are challenging due a number a factors, including the variability in samples, the density function of the probes, and high aspect characteristics of the structure. Previously we developed a process that allowed us to selectively remove the hedges and leave the probes intact. We have now quantified and refined that process.