| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Friday Sessions |
| Session PS+2D+SE+TF-FrM |
| Session: | Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition |
| Presenter: | Michelle M. Paquette, University of Missouri-Kansas City |
| Authors: | M.M. Paquette, University of Missouri-Kansas City R. Thapa, University of Missouri-Kansas City L. Dorsett, University of Missouri-Kansas City R. Bale, University of Missouri-Kansas City S. Malik, University of Missouri-Kansas City D. Bailey, University of Missouri-Kansas City A.N. Caruso, University of Missouri-Kansas City J.D. Bielefeld, Intel Corporation S.W. King, Intel Corporation |
| Correspondent: | Click to Email |
Atomic layer deposition (ALD) research has exploded in this era of electronic miniaturization, smart materials, and nanomanufacturing. To live up to its potential, however, ALD must be adaptable to many types of materials growth. To extend the reach of this layer-by-layer deposition framework, researchers have begun to explore molecule based processes. Still relatively rare, existing molecular layer deposition (MLD) processes are limited and typically based on the condensation of “linear” 2D or “brush-type” organic polymer chains. To this end, icosahedral carborane (C2B10H12) molecules provide an interesting target. Carboranes have been used in the plasma-enhanced chemical vapor deposition of boron carbide films for low-k interlayer dielectrics, neutron detection, and a variety of protective coatings. These are symmetric twelve-vertex molecules, known to form close-packed monolayers and to possess labile H atoms at each of the vertices capable of cross-linking in the presence of heat, plasma, or other energy source. As such, the carborane molecule is particularly intriguing as a novel MLD precursor for 3D growth, possessing unique symmetry, reactivity, and volatility properties not commonly encountered in traditional organic molecules. However, a challenge in developing a layer-by-layer process lies in achieving the selective coupling chemistry required, which in the case of molecular reagents requires typically exotic bis-functional derivatives. Herein we describe progress in developing a plasma-enhanced molecular layer deposition process based on carborane derivatives, where the plasma is exploited to create the surface functionalization necessary for selective coupling and to cross-link carborane layers. We investigate the deposition of several carborane derivatives on different functionalized surfaces with the application of various types of plasmas toward achieving controlled layer-by-layer growth of thin boron carbide films.