AVS 66th International Symposium & Exhibition
    Plasma Science and Technology Division Friday Sessions
       Session PS+2D+SE+TF-FrM

Paper PS+2D+SE+TF-FrM12
Tribological Properties of Plasma Enhanced Atomic Layer Deposition TiMoN with Substrate Bias

Friday, October 25, 2019, 12:00 pm, Room B130

Session: Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition
Presenter: Mark Sowa, Veeco ALD
Authors: M.J. Sowa, Veeco ALD
A.C. Kozen, University of Maryland
N.C. Strandwitz, Lehigh University
T.F. Babuska, Lehigh University
B.A. Krick, Lehigh University
Correspondent: Click to Email
In our previous study, we demonstrated a tertiary plasma enhanced atomic layer deposited transition metal nitride (TiVN) with exceptional wear rates and friction coefficients. We have extended that work with an investigation of another tertiary transition metal nitride system, TixMoyNz. For films deposited at 250°C and 300W on a Veeco CNT G2 Fiji PEALD system, we have demonstrated how the ratio of TiN:MoN cycles (1:0, 2:1, 1:1, 1:2, 0:1) provides linear control of the Ti:Mo in the resulting film. Through application of an 13.56MHz RF substrate bias (0-188V) during the plasma step, ion bombardment energy of the substrate can be varied, providing a means for tweaking the films physical and chemical characteristics which in turn are shown to impact the resulting film's tribological properties. As PEALD metal nitrides have broader interest than wear layers and to gain insights on the interrelationships of the mechanical properties, the processing details, and other film properties, we also report on the resulting film composition/impurities, density, crystallinity, optical properties, resistivity, and morphology.