| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Friday Sessions |
| Session PS+2D+SE+TF-FrM |
| Session: | Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition |
| Presenter: | Christopher Muratore, Department of Chemical and Materials Engineering, University of Dayton |
| Authors: | N.R. Glavin, Air Force Research Laboratory C. Muratore, Department of Chemical and Materials Engineering, University of Dayton |
| Correspondent: | Click to Email |
Synthesis of flexible two-dimensional electronic devices using low-cost, naturally abundant materials (e.g., MoS2) directly onto inexpensive polymeric materials at economically viable scales enables use of their unique characteristics in grand challenge areas of energy, healthcare, and national security. Recently-proven approaches for low temperature, plasma-based 2D synthesis suitable for flexible substrates developed by the authors include growth of amorphous materials with subsequent photonic annealing to access crystalline domain sizes up to several microns. This approach has been demonstrated for synthesis of large area ultrathin monolithic layers as well as MoS2/WS2/BN multilayers with pristine interfaces, allowing interrogation of intrinsic properties of 2D materials and their heterostructures as they apply to diverse optoelectronic devices, with a current focus on molecular sensing. Advantages of plasma-based approaches will be discussed in terms of detailed kinetic studies of crystal formation and compositional evolution on the substrate surface. Correlations of structure, especially defect densities, to materials properties and device performance will be discussed in the context of diverse device applications including photodetectors and molecular sensors.