AVS 66th International Symposium & Exhibition | |
Advanced Ion Microscopy and Ion Beam Nano-engineering Focus Topic | Wednesday Sessions |
Session HI+AS+CA-WeA |
Session: | Advanced Ion Microscopy and Surface Analysis Applications |
Presenter: | Arkady V. Krasheninnikov, Helmholtz-Zentrum Dresden-Rossendorf, Germany |
Correspondent: | Click to Email |
In my presentation, I will dwell upon the multi-scale atomistic computer simulations of the impacts of ions onto free-standing (e.g., suspended on a TEM grid) and supported (deposited on various substrates) 2D materials, including graphene and transition metal dichalcogenides (TMDs), such as MoS2 and WS2. I will emphasize the differences between defect production under ion irradiation in 2D materials and bulk solids. The theoretical results will be augmented by the experimental data obtained by the coworkers. I will further present the results of multi-scale simulations of ion irradiation of free-standing [1] and supported [2] graphene and 2D TMDs, and demonstrate that depending on ion mass and energy, the defect production can be dominated by direct ion impacts, back scattered ions or atoms sputtered from the substrate [2]. Finally, I will touch upon the interaction of highly-charged [3] and swift heavy ions [4] with 2D systems and overview recent progress in modelling this using non-adiabatic approaches including time-dependent density functional theory and Ehrenfest dynamics [5].
1. M. Ghorbani-Asl, S. Kretschmer, D.E. Spearot, and A. V. Krasheninnikov, 2D Materials 4 (2017) 025078.
2. S. Kretschmer, M. Maslov, S. Ghaderzadeh, M. Ghorbani-Asl, G. Hlawacek, and A. V. Krasheninnikov, ACS Applied Materials & Interfaces 10 (2018) 30827.
3. R. A. Wilhelm, E. Gruber, J. Schwestka, R. Kozubek, T.I. Madeira, J.P. Marques, J. Kobus, A. V. Krasheninnikov, M. Schleberger, and F. Aumayr, Phys. Rev. Lett. 119 (2017) 103401.
4. R. Kozubek, M. Tripathi, M. Ghorbani-Asl, S. Kretschmer, L. Madauß, E. Pollmann, M. O’Brien, N. McEvoy, U. Ludacka, T. Susi, G.S. Duesberg, R.A. Wilhelm, A. V. Krasheninnikov, J. Kotakoski, and M. Schleberger J. Phys. Chem. Lett. 10 (2019) 904.
5. A. Ojanperä, A. V. Krasheninnikov, and M. Puska, Phys. Rev. B 89 (2014) 035120.