| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 9:00am | TF2-MoM3 Radical Enhanced Atomic Layer Deposition of Cobalt Oxide Based Electrodes for 3D Lithium-ion Battery Applications Ryan Sheil, J. Lau, B. Dunn, J.P. Chang, University of California at Los Angeles |
| 9:20am | TF2-MoM4 Fast-charging 3D Battery Electrodes with High-Capacity Materials Using Large Area Atmospheric Pressure Spatial ALD Lucas Haverkate, S. Unnikrishnan, D. Hermes, Holst Centre / TNO, The Netherlands, F. Roozeboom, Eindhoven University of Technology, The Netherlands, F. Zorro, F. Grob, E. Balder, Holst Centre / TNO, The Netherlands, P. Poodt, Holst Centre / TNO and SALDtech B.V., Netherlands, M. Tulodziecki, Holst Centre / TNO, The Netherlands |
| 9:40am | TF2-MoM5 Invited Paper Thin Film Technology - Opening New Frontiers for Solid State Batteries Gary Rubloff, K. Gregorczyk, University of Maryland, College Park, A. Pearse, Control Electron, S.B. Lee, University of Maryland, College Park, A.A. Talin, Sandia National Laboratories, Livermore |
| 10:40am | TF2-MoM8 Invited Paper Atomic Layer Deposition: A Scalable Process for Enabling the Next Generation of High Performance Materials Arrelaine Dameron, Forge Nano |
| 11:20am | TF2-MoM10 A Facile CVD Route for the Large-scale Fabrication of Silicon-graphite Core-shell Composites Giorgio Nava, J. Schwan, L. Mangolini, University of California, Riverside |