| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+PS-ThM1 ALD and Diffusion in High Aspect Ratio Carbon Nanotube Forests David Kane, R.C. Davis, R.R. Vanfleet, Brigham Young University |
| 8:20am | TF+PS-ThM2 Nanoporous Reference Substrates for ALD on High Aspect Ratio High Surface Area Materials Dmitri Routkevitch, InRedox |
| 8:40am | TF+PS-ThM3 Fine-tuned Resistive Coatings for Detector Applications Maximilian Gebhard, A.U. Mane, D. Choudhury, S. Letourneau, D.J. Mandia, Y. Zhang, J.W. Elam, Argonne National Laboratory |
| 9:00am | TF+PS-ThM4 Tungsten Atomic Layer Deposition on Vertically Aligned Carbon Nanotube Structures Ryan Vanfleet, R.C. Davis, D.D. Allred, R.R. Vanfleet, Brigham Young University |
| 9:20am | TF+PS-ThM5 Invited Paper ALD in Metal Organic Frameworks: Toward Single Site Synthesis and Sinter-Resistant Catalysts Alex Martinson, Argonne National Laboratory |
| 11:00am | TF+PS-ThM10 Alumina Deposition by Atomic Layer Deposition (ALD) on Flat Surfaces and High Aspect Ratio Structures Dhruv Shah, D.I. Patel, D.J. Jacobsen, J.E. Erickson, M.R. Linford, Brigham Young University |
| 11:20am | TF+PS-ThM11 Resistivity of the Alumina Diffusion Barrier in Catalytic Carbon Nanotube Growth Berg Dodson, G. Chen, R.C. Davis, R.R. Vanfleet, Brigham Young University |
| 11:40am | TF+PS-ThM12 High Temperature Active CeO2 Nanorods Generated via Diffusion Limited Atomic Layer Deposition Haoming Yan, X.Z. Yu, Q. Peng, University of Alabama |