AVS 65th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF+PS-ThM

Invited Paper TF+PS-ThM5
ALD in Metal Organic Frameworks: Toward Single Site Synthesis and Sinter-Resistant Catalysts

Thursday, October 25, 2018, 9:20 am, Room 104B

Session: Deposition Processes for 3D and Extreme Geometries
Presenter: Alex Martinson, Argonne National Laboratory
Correspondent: Click to Email

Reproducibly and homogeneously synthesizing single-site transition metal catalysts on exceedingly high surface area supports with stability under catalytic conditions remains a grand challenge. To address this challenge, we utilize atomic layer deposition (ALD) in metal-organic frameworks (MOFs), a process we call AIM. Here, ALD provides a straightforward gas phase route to access a wide variety of small precision clusters with spatial and dimensional homogeneity. The well-defined structure of MOF NU-1000 framework and nodes allows for detailed characterization of their size and uniforming as well as insight into their inherent stability. This talk will discuss several classes of ALD precursors and processing conditions that have been identified to be compatible with few-atom cluster deposition in Zr-based MOF NU-1000.