Paper TF+PS-ThM12
High Temperature Active CeO₂ Nanorods Generated via Diffusion Limited Atomic Layer Deposition

Thursday, October 25, 2018, 11:40 am, Room 104B

CeO₂ has attracted lots of attention due to its superior oxygen storage and donating ability as a catalyst support. CeO₂ nanorods has the best donating ability than all the other types of CeO₂ materials. However, the nanorods change its morphology and lose its activity at 400°C or above. Therefore, improving the thermal stability of CeO₂ nanorods can unlock the potential applications of CeO₂ nanorods in the high temperature applications. In this work, we introduce a diffusion-limited Al₂O₃ atomic layer deposition to selectively passivate the surface site of CeO₂ nanorods, largely enhancing its thermal stability and its oxygen storage capacity simultaneously.