| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+AM+EM+PS-TuM1 Invited Paper New Approaches for Area-Selective Atomic Layer Deposition: Inspiration from Etching Adrie Mackus, Eindhoven University of Technology, The Netherlands, Nederland |
| 8:40am | TF+AM+EM+PS-TuM3 Nucleation of HfO2 on Si, SiO2 and TiN Substrates in PE-ALD Processes Investigated by In situ Ellipsometry and Optical Emission Specroscopy (OES) Marceline Bonvalot, S. belahcen, V. Pesce, A. Chaker, P. Gonon, C. Vallée, A. Bsiesy, LTM, Univ. Grenoble Alpes, CEA-LETI, France |
| 9:00am | TF+AM+EM+PS-TuM4 Topographical Selectivity with BN Electron-Enhanced ALD Jaclyn Sprenger, A.S. Cavanagh, H. Sun, University of Colorado at Boulder, A. Roshko, P. Blanchard, National Institute of Standards and Technology, S.M. George, University of Colorado at Boulder |
| 9:20am | TF+AM+EM+PS-TuM5 Optimization by In situ Ellipsometry of ALD and ALE Successive Steps for the Selective Atomic Layer Deposition of Ta2O5 on TiN and Si. Vincent Pesce, C. Vallée, LTM, Univ. Grenoble Alpes, CEA-LETI, France, R. Gassilloud, Cea Leti, France, A. Chaker, M. Bonvalot, B. Pelissier, LTM, Univ. Grenoble Alpes, CEA-LETI, France, N. Nicolas, Cea, France, A. Bsiesy, LTM, Univ. Grenoble Alpes, CEA-LETI, France |
| 9:40am | TF+AM+EM+PS-TuM6 ALD and PEALD of ZnO on MoS2 and WSe2 Timothy N. Walter, S. Lee, The Pennsylvania State Univeristy, M. Chubarov, The Pennsylvania State University, X. Zhang, The Pennsylvania State Univeristy, T.H. Choudhury, J.M. Redwing, The Pennsylvania State University, T.N. Jackson, S.E. Mohney, The Pennsylvania State Univeristy |
| 11:00am | TF+AM+EM+PS-TuM10 Invited Paper From Fundamental Insights into Growth and Nucleation Mechanisms to Area-selective Deposition Annelies Delabie, IMEC & KU Leuven, Belgium, J. Soethoudt, KU Leuven, Belgium, G. Pourtois, S. Van Elshocht, K. Barla, Imec, Belgium, F. Grillo, E. Marques, J.R. van Ommen, TU Delft, Netherlands |
| 11:40am | TF+AM+EM+PS-TuM12 DETA SAMs as ALD Ru Inhibitor for Area-selective Bottom-up Interconnects Ivan Zyulkov, IMEC & KU Leuven, S. Armini, IMEC, Belgium, S. De Gendt, IMEC, KU Leuven, Belgium |