| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS-ThA1 In-situ Measurement of Electron Emission and Electron Reflection Yields Mark Sobolewski, National Institute of Standards and Technology (NIST) |
| 2:40pm | PS-ThA2 Electron Energy Distribution Measurements in Dusty Non-thermal Plasmas Austin Woodard, L. Mangolini, University of California, Riverside |
| 3:00pm | PS-ThA3 Invited Paper The Surface Plasmon Energy and the Secondary Electron Emission on an Oxidized Aluminum Surface J.-T. Li, J. Qiu, Yi-Kang Pu, Tsinghua University, China |
| 4:00pm | PS-ThA6 Transient Phenomena in Power Modulated Chlorine Plasma Priyanka Arora, T. List, T. Ma, University of Houston, S. Shannon, North Carolina State University, S. Nam, Samsung Electronics Co., Ltd., Republic of Korea, V.M. Donnelly, University of Houston |
| 4:20pm | PS-ThA7 Measurements of RF Magnetic Fields and Plasma Current in Coupled Low and Very High Dual-Frequency Plasma Sources J.P. Zhao, P.L.G. Ventzek, B. Lane, Tokyo Electron America, Inc., Toshihiko Iwao, K. Ishibashi, Tokyo Electron Technology Solutions Ltd., Japan |
| 4:40pm | PS-ThA8 Self-neutralized Nearly Monoenergetic Positive Ion Beam Extracted From a Pulsed Plasma Ya-Ming Chen, R. Sawadichai, University of Houston, S. Tian, Lam Research Corporation, V.M. Donnelly, D.J. Economou, P. Ruchhoeft, University of Houston |
| 5:00pm | PS-ThA9 Diagnostics of Plasma Neutral Species in a Very High Frequency Oxygen Plasma with High Sensitivity Broadband Absorption Spectroscopy Jianping Zhao, P.L.G. Ventzek, B. Lane, Tokyo Electron America, Inc., T. Iwao, K. Ishibashi, Tokyo Electron Technology Solutions Ltd., Japan, J.-P. Booth, CNRS, Ecole Polytechnique, France |
| 5:20pm | PS-ThA10 Development of the Virtual Metrology Using a Plasma Information Variable (PI-VM) for Monitoring SiO2 Etch Depth Yunchang Jang, H.-J. Roh, S. Ryu, J.-W. Kwon, G.-H. Kim, Seoul National University, Republic of Korea |
| 5:40pm | PS-ThA11 Model Predictive Control of Plasma Density in Ar/SF6 Capacitively Coupled Plasma Source Sangwon Ryu, H.-J. Roh, Y. Jang, D. Park, J. Koo, J.M. Lee, G.-H. Kim, Seoul National University, Republic of Korea |