AVS 65th International Symposium & Exhibition
    Plasma Science and Technology Division Thursday Sessions
       Session PS-ThA

Invited Paper PS-ThA3
The Surface Plasmon Energy and the Secondary Electron Emission on an Oxidized Aluminum Surface

Thursday, October 25, 2018, 3:00 pm, Room 104A

Session: Plasma Diagnostics, Sensors and Controls
Presenter: Yi-Kang Pu, Tsinghua University, China
Authors: J.-T. Li, Tsinghua University, China
J. Qiu, Tsinghua University, China
Y.-K. Pu, Tsinghua University, China
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The energy evolution of surface plasmons and the apparent secondary electron yield on an aluminum surface during the oxidation process are investigated in an experiment under a controlled environment. The surface plasmon energy is determined from the location of the surface plasmon loss peak in the EELS spectra; at the same time, the total oxygen coverage (in the submonolayer regime) and the oxide layer thickness (in the multilayer regime) are obtained from the peak profiles of O 1s and Al 2p photoemission lines in the XPS spectra. The apparent secondary electron yield is deduced from the breakdown voltage between two parallel plate electrodes in a 360 mTorr argon environment using a Townsend breakdown model. In the submonolayer regime, both the surface plasmon energy and secondary electron yield decrease with the total oxygen coverage. In the multilayer regime, the surface plasmon energy continues to decrease with the oxide layer thickness although the rate of decrease is lower. However, the secondary electron yield sharply increases with the oxide layer thickness. In this presentation, we will discuss possible mechanisms for the variation of these quantities and compare the measured results with that from the models.