AVS 65th International Symposium & Exhibition
    MEMS and NEMS Group Wednesday Sessions

Session MN+NS+PS-WeM
IoT Session: Multiscale Manufacturing: Enabling Materials and Processes

Wednesday, October 24, 2018, 8:00 am, Room 202B
Moderators: Susan Burkett, The University of Alabama, Sébastien Hentz, CEA/LETI-University Grenoble Alpes, France


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am MN+NS+PS-WeM1 Invited Paper
Miniaturizing 3D Printed Microfluidics: State-of-the-Art and Outlook
Greg Nordin, Brigham Young University
8:40am MN+NS+PS-WeM3
A Novel Inkjet Printing Technology Based on Plasma Conversion of Metal-Salt Based Inks for the Fabrication of Microfabricated Sensors
Y. Sui, R.M. Sankaran, Christian Zorman, Case Western Reserve University
9:00am MN+NS+PS-WeM4
Full Wafer Thickness Through Silicon Vias for MEMS Devices
Andrew Hollowell, E. Baca, D. Dagel, M.B. Jordan, L. Menk, K. Musick, T. Pluym, J. McClain, Sandia National Laboratories
9:20am MN+NS+PS-WeM5
Scaling from Die Level to Full 150 mm Wafer TSV Filling through Fluid Dynamics Modeling and Current Controlled Deposition
Ehren Baca, M.B. Jordan, L. Menk, K. Musick, P. Yeh, A.E. Hollowell, Sandia National Laboratories
9:40am MN+NS+PS-WeM6
Batch Level Electroless Under Bump Metallization for Singulated Semiconductor Die
Matthew Jordan, E. Baca, J. Pillars, C. Michael, A.E. Hollowell, Sandia National Laboratories
11:00am MN+NS+PS-WeM10 Invited Paper
MEMS-based Atomic Force Microscopy Probes: From Electromechanical to Optomechanical Vibrating Sensors
Bernard Legrand, LAAS-CNRS, France, L. Schwab, LAAS-CNRS, Univ Tououse, France, P. Allain, I. Favero, MPQ, CNRS, Univ Paris Diderot, France, M. Faucher, D. Théron, IEMN, CNRS, Univ Lille, France, B. Walter, Vmicro SAS, France, J.P. Salvetat, CRPP, CNRS, Univ Bordeaux, France, S. Hentz, G. Jourdan, CEA-LETI, France
11:40am MN+NS+PS-WeM12
Suppressing Secondary Grain Growth in Sc0.125Al0.875N Using a CMOS Compatible Electrode
Giovanni Esteves, M. Berg, M.D. Henry, B.A. Griffin, E.A. Douglas, Sandia National Laboratories