| AVS 65th International Symposium & Exhibition | |
| In-situ Microscopy, Spectroscopy, and Microfluidics Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:20pm | MM+AS+NS+PC+SS-MoA1 Invited Paper Bridging the Material and Pressure Gap in Synchrotron based Photoelectron in Situ/Operando Studies Luca Gregoratti, M. Amati, P. Zeller, Elettra-Sincrotrone Trieste, Italy |
| 2:00pm | MM+AS+NS+PC+SS-MoA3 Transition Metal Complexes in Aqueous Solutions Characterized by Liquid Jet Ambient Pressure X – ray Photoelectron Spectroscopy Jared Bruce, J.C. Hemminger, University of California, Irvine |
| 2:20pm | MM+AS+NS+PC+SS-MoA4 Interfacial Electrochemistry in Liquids Probed with Photoemission Electron Microscopy S. Nemsak, Forschungszentrum Juelich GmbH, Germany, E. Strelcov, NIST Center for Nanoscale Science and Technology, Tomas Duchon, Forschungszentrum Juelich GmbH, Germany, H.X. Guo, National Institute of Standards and Technology, J. Hackl, Forschungszentrum Juelich GmbH, Germany, A. Yualev, NIST Center for Nanoscale Science and Technology, I. Vlassiouk, Oak Ridge National Laboratory, D.N. Mueller, C.M. Schneider, Forschungszentrum Juelich GmbH, Germany, A. Kolmakov, NIST Center for Nanoscale Science and Technology |
| 3:40pm | MM+AS+NS+PC+SS-MoA8 Invited Paper Practical Liquid Cell Microscopy - Opportunities and Challenges Daan Hein Alsem, K. Karki, Hummingbird Scientific, J.T. Mefford, W.C. Chueh, Stanford University, N.J. Salmon, Hummingbird Scientific |
| 4:20pm | MM+AS+NS+PC+SS-MoA10 Observation of Electric Double Layer under Graphene by Scanning Electron Microscopy Hongxuan Guo, A. Yulaev, E. Strelcov, National Institute of Standards and Technology (NIST)/ University of Maryland, College Park, A. Tselev, CICECO and Department of Physics, University of Aveiro,Portugal, A. Kolmakov, National Institute of Standards and Technology |