| AVS 65th International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | HI-WeA1 Invited Paper Delving into the Finer Details of Helium FIBID Frances Allen, University of California, Berkeley |
| 3:00pm | HI-WeA3 Invited Paper Anderson Localization of Graphene by Helium Ion Irradiation Y. Naitou, Shinichi Ogawa, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| 4:20pm | HI-WeA7 Invited Paper The Frontiers of Focused Ion Beam in Semiconductor Applications Shida Tan, Intel Corporation |
| 5:00pm | HI-WeA9 2D Materials Under Ion Irradiation: In-situ Experiments and the Role of the Substrate Gregor Hlawacek, S. Kretschmer, Helmholtz Zentrum Dresden-Rossendorf, Germany, M. Maslov, Moscow Institute of Physics and Technology, S. Ghaderzadeh, M. Ghorbani-Asl, A.V. Krasheninnikov, Helmholtz Zentrum Dresden-Rossendorf, Germany |
| 5:20pm | HI-WeA10 Sample Heating Effects from Light Ions in Thin Films John A. Notte, B.B. Lewis, Carl Zeiss Microscopy, LLC |
| 5:40pm | HI-WeA11 Helium Ion Direct Write Patterning of Superconducting Electronics Shane Cybart, E.Y. Cho, H. Li, UC Riverside, Y. Naitou, S. Ogawa, National Institute of Advanced Industrial Science and Technology (AIST), Japan |