AVS 65th International Symposium & Exhibition
    Advanced Ion Microscopy Focus Topic Wednesday Sessions
       Session HI-WeA

Paper HI-WeA11
Helium Ion Direct Write Patterning of Superconducting Electronics

Wednesday, October 24, 2018, 5:40 pm, Room 203B

Session: Novel Beam Induced Material Engineering & Nano-Patterning
Presenter: Shane Cybart, UC Riverside
Authors: S.A. Cybart, UC Riverside
E.Y. Cho, UC Riverside
H. Li, UC Riverside
Y. Naitou, National Institute of Advanced Industrial Science and Technology (AIST), Japan
S. Ogawa, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Correspondent: Click to Email
We report the fabrication of nanoscale Josephson junctions in 25 nm thick YBa2Cu3O7 thin films. Our approach utilizes a finely focused gas field ion source from a helium ion microscope to directly modify the material on the nanometer scale to convert irradiated regions of the film into insulators. In this manner, the film remains intact and no material is milled or removed. We will present results of how the critical dimension beam affects the electrical properties. Furthermore we reflect on the potential of this method for future device applications in superconducting computing.

We acknowledge T. Iijima and Y. Morita for the usage of the HIM at SCR station of AIST.