AVS 65th International Symposium & Exhibition
    Plasma Science and Technology Division Wednesday Sessions
       Session PS+MN-WeM

Invited Paper PS+MN-WeM10
Low Temperature Plasmas in Nanotechnology Applications

Wednesday, October 24, 2018, 11:00 am, Room 104C

Session: IoT Session: Enabling IoT Era
Presenter: Meyya Meyyappan, NASA Ames Research Center
Correspondent: Click to Email

The versatility and low temperature processing capability has allowed the use of gas discharges in a variety of nanotechnology applications. This talk will provide an overview of our activities on the use of low temperature plasmas in printed electronics and also the growth of nanomaterials and application development. We have developed an atmospheric pressure plasma jet as an alternative to inkjet and aerosol printing to deposit nanomaterials on paper, plastic, metal foils and textiles etc. to enable flexible, printable electronics. This is a single-step process that does not require a follow-on annealing or sintering in order to get consolidated thin films as is customary with other techniques. The surface temperature is in the range of 20-80 deg C depending on the carrier gas used and the morphology of the film can be controlled by varying the carrier gas and other plasma parameters. Examples of printed materials and their applications will be discussed. The talk will also cover growth of vertical graphene or carbon nanowalls using PECVD on various substrates with interesting properties as well as carbon nanofibers for a variety of applications. The author thanks Ram Gandhiraman, Jessica Koehne, Mike Oye, Mehrdad Shaygan, Mark Rummeli and Jeong-soo Lee.