AVS 63rd International Symposium & Exhibition
    Thin Film Tuesday Sessions

Session TF-TuM
Advanced CVD and ALD Processing, ALD Manufacturing and Spatial-ALD

Tuesday, November 8, 2016, 8:00 am, Room 105A
Moderators: Steven M. George, University of Colorado at Boulder, Jesse Jur, North Carolina State University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF-TuM1
An Analytic Expression for Reactant Utilization in CVD and ALD Chambers
Edward McInerney, Lam Research Corporation
8:20am TF-TuM2
Growth of Silicon Films at Room Temperature Using Electron Enhanced Atomic Layer Deposition
Jaclyn Sprenger, A.S. Cavanagh, H. Sun, S.M. George, University of Colorado, Boulder
8:40am TF-TuM3 Invited Paper
Chemical Vapor Deposition within the ALD window – Quantitative Analysis of Precursor Surface Kinetics in Thin Film Formation
Michael Reinke, Y. Kuzminykh, P. Hoffmann, Empa, Swiss Federal Laboratories for Materials Science and Technology, Switzerland
9:20am TF-TuM5
A Rotation Fluidization Coupled Atomic Layer Deposition Reactor for Nanoparticle Coating
C.L. Duan, State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, China, R. Chen, State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, School of Optical and Electronic Information, Huazhong University of Science and Technology, China, Kun Cao, Huazhong University of Science and Technology, Wuhan, China
9:40am TF-TuM6
Atmospheric Pressure ALD in Porous Substrates: The Effect of Pressure on Step Coverage
E. Balder, F. Roozeboom, Paul Poodt, Holst Centre / TNO, Netherlands
11:00am TF-TuM10 Invited Paper
New Spatial ALD platform for Semiconductor Manufacturing
Joseph Yudovsky, Applied Materials, Inc.
11:40am TF-TuM12
Spatial MLD of Polyamide Films on Flexible Substrates using a New Rotating Cylinder Reactor in a Custom Oven
Daniel Higgs, University of Colorado Boulder, S.M. George, University of Colorado at Boulder
12:00pm TF-TuM13
Spatial Atomic Layer Deposition for Porous and Fibrous Materials
Gregory Parsons, A.H. Brozena, C.J. Oldham, North Carolina State University