AVS 63rd International Symposium & Exhibition
    Plasma Science and Technology Tuesday Sessions

Session PS-TuM
Plasma Diagnostics, Sensors and Control

Tuesday, November 8, 2016, 8:00 am, Room 104B
Moderator: Michael Gordon, University of California at Santa Barbara


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am PS-TuM1 Invited Paper
Translational and Vibrational Energy in Cl2 and O2 Plasmas Probed by Innovative Optical Diagnostics
Jean-Paul Booth, D. Marinov, M. Foucher, O.Y.N. Guaitella, LPP-CNRS, Ecole Polytechnique, France, C. Drag, Laboratoire Aime Cotton, CNRS-U. Paris-Sud, France, A. Agarwal, S. Rauf, Applied Materials Inc.
8:40am PS-TuM3
Spectroscopic Measurement of Molecular Densities and Temperatures in Processing Plasmas
Yaser Helal, C.F. Neese, F.C. De Lucia, The Ohio State University, A. Agarwal, B. Craver, P.R. Ewing, P.J. Stout, M.D. Armacost, Applied Materials, Inc.
9:20am PS-TuM5
Pulsed Capacitively Coupled Plasma Ignition: PROES and RF-IV Diagnostics
John Poulose, M.J. Goeckner, L.J. Overzet, The University of Texas at Dallas
9:40am PS-TuM6
Control of Ion Energy Distributions on Insulating Surfaces using Pulsed Plasmas
Tyler List, T. Mu, V.M. Donnelly, D.J. Economou, University of Houston
11:00am PS-TuM10 Invited Paper
Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF4
Julian Schulze, West Virginia University, B. Berger, Ruhr-University Bochum, Germany, S. Brandt, West Virginia University, B. Bruneau, Ecole Polytechnique, Palaiseau, France, Y. Liu, Dalian University of Technology, I. Korolov, A. Derzsi, Hungarian Academy of Sciences, E. Schuengel, M. Koepke, West Virginia University, T. Mussenbrock, Ruhr-University Bochum, Germany, E.V. Johnson, T. Lafleur, J.-P. Booth, Ecole Polytechnique, Palaiseau, France, D. O'Connell, T. Gans, University of York, UK, YN. Wang, Dalian University of Technology, Z. Donko, Hungarian Academy of Sciences
11:40am PS-TuM12
Correlation of III/V Semiconductor Etch Results with Physical Parameters of High Density Reactive Plasmas Excited by Electron Cyclotron Resonance
Gerhard Franz, Munich University of Applied Sciences, Germany, R. Meyer, M.-C. Amann, Technische Universität München, Germany
12:00pm PS-TuM13
Mapping Plasma Potential of Rotating Ionization Zone in DC Magnetron Sputtering
Matjaz Panjan, Lawrence Berkeley National Laboratory, Slovenia, A. Anders, Lawrence Berkeley National Laboratory