| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
| Session PS-TuM |
| Session: | Plasma Diagnostics, Sensors and Control |
| Presenter: | John Poulose, The University of Texas at Dallas |
| Authors: | J. Poulose, The University of Texas at Dallas M.J. Goeckner, The University of Texas at Dallas L.J. Overzet, The University of Texas at Dallas |
| Correspondent: | Click to Email |
Pulsed plasma ignition induces rapid changes to the electron energy distribution function. These transitions are of particular interest in the application of etching and deposition of semiconductors. In this article we report temporally and
spatially resolved measurements of the optical emission intensity and RF current and voltage for 1 kHz pulsed plasmas in both electropositive (Ar) and electronegative (CF4=O2=Ar) gas mixtures. This allows us to develop a better understanding of the transients during the beginning and end of the powered component of the RF pulse. We are able show the development of the plasma sheath early in the pulse by combining phase resolved optical emission intensity measurements with measurements of the radio frequency power delivery. In the electronegative discharge we find that the sheath width is minuscule early in the pulse but then expands rapidly. The rapid expansion results in a wave like phenomenon with negative ions bouncing between the growing sheaths.