| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | PS+AS+SS-MoA1 Invited Paper Atomic-scale Analyses of Plasma Etching for Unconventional Materials in Microelectronics Satoshi Hamaguchi, K. Karahashi, Osaka University, Japan |
| 2:20pm | PS+AS+SS-MoA3 Plasma Wall Interactions: Y2O3 Wall Interaction in Cl2 Plasma Etching of Si and NF3 Plasma Cleaning Tianyu Ma, T. List, V.M. Donnelly, University of Houston |
| 2:40pm | PS+AS+SS-MoA4 Novel atomic order CD Control Technology by Fusion of Quasi-ALE and ALD Yoshihide Kihara, T. Hisamatsu, Tokyo Electron Miyagi Limited, Japan, T. Oishi, S. Ogawa, H. Watanabe, Tokyo Electron Miyagi Limited, A. Tsuji, M. Honda, Tokyo Electron Miyagi Limited, Japan |
| 3:00pm | PS+AS+SS-MoA5 Development of a New Analysis Technique of Nanostructures Etched by Plasmas: Quasi In-Situ TEM EDX Characterization Matthieu Serege, LTM, Univ. Grenoble Alpes, CEA-LETI, G. Cunge, LTM, Univ. Grenoble Alpes, CEA-LETI, France, L. Vallier, E. Latu-Romain, LTM, Univ. Grenoble Alpes, CEA-LETI, O. Joubert, LTM, Univ. Grenoble Alpes, CEA-LETI, France |
| 3:20pm | PS+AS+SS-MoA6 Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes Vahagn Martirosyan, LTM, Univ. Grenoble Alpes, CEA-LETI, France, E. Despiau-Pujo, CNRS - LTM, France, O. Joubert, LTM, Univ. Grenoble Alpes, CEA-LETI, France |
| 4:20pm | PS+AS+SS-MoA9 Patterned Chromium Hard Mask Etching in a Two Reactant Gas for Bit Patterned Media Template Fabrication Daniel Staaks, Molecular Foundry, Lawrence Berkeley National Lab, X. Yang, Seagate Technology, S. Dallorto, S.D. Dhuey, S. Sassolini, Molecular Foundry, Lawrence Berkeley National Lab, K.Y. Lee, Seagate Technology, I.W. Rangelow, Ilmenau University of Technology, Germany, D.L. Olynick, Molecular Foundry, Lawrence Berkeley National Lab |
| 4:40pm | PS+AS+SS-MoA10 Alternative Solutions for Nanometric-Precision Etching: H2 Plasmas Modification of Si/ SiN Thin-Films Emilie Despiau-Pujo, V. Martirosyan, O. Joubert, LTM - CNRS/Univ Grenoble Alpes/CEA, France |
| 5:00pm | PS+AS+SS-MoA11 Plasma Dynamics at the Surface Interface in Low Pressure Capacitively and Inductively Coupled Plasmas Martin Blake, D. O'Connell, University of York, UK, A.R. Gibson, LPP, CNRS, Ecole Polytechnique, Université Paris-Saclay, France, T. Gans, University of York, UK |