AVS 63rd International Symposium & Exhibition, Session AS+SS-ThM

AVS 63rd International Symposium & Exhibition
Applied Surface Science	Thursday Sessions

Session AS+SS-ThM
Depth Profiling, Buried Interfaces, and 3D Analyses

Thursday, November 10, 2016, 8:00 am, Room 101B
Moderators: Gregory Fisher, Physical Electronics USA, Karen Gaskell, University of Maryland, College Park

Click here to Download program book for this session
in Adobe Acrobat format

Click a paper to see the details. Presenters are shown in bold type.

8:00am	AS+SS-ThM1 Pushing the Limits of Bonded Multi-Wafer Stack Heights while Maintaining High Precision Alignment Alireza Narimannezhad, J. Jennings, M.H. Weber, K.G. Lynn, Washington State University
8:20am	AS+SS-ThM2 Porous Si Stack Analysis by Model Based Infrared Reflectometry (MBIR) Sukti Chatterjee, L. Scudder, P. Narwankar, Applied Materials Inc.
8:40am	AS+SS-ThM3 Invited Paper Applications of Atom Probe Tomography on 3D Semiconductor Devices AjayKumar Kambham, D. Flatoff, P.A.W. van der Heide, GLOBALFOUNDRIES U.S. Inc.
9:20am	AS+SS-ThM5 Analysis of ALD/CVD Thin Film Conformality using Lateral High Aspect Ratio (LHAR) Structures: Experimental Characteristics and Proposed Classifications Riikka Puurunen, VTT Technical Research Centre of Finland, J. Dendooven, V. Cremers, C. Detavernier, Ghent University, Belgium
9:40am	AS+SS-ThM6 In Situ Liquid SIMS Investigation of Chemical Components of the Solid-Electrolyte Interface in Li Ion Batteries Zihua Zhu, C. Wang, Y. Zhou, D.R. Baer, W. Xu, R. Cao, X. Yu, P. Yan, R. Zhao, Pacific Northwest National Laboratory
11:00am	AS+SS-ThM10 Electronic and Physical Changes to Soft Materials Caused by Gas Cluster Sputtering Christopher Goodwin, Z.E. Voras, T.P. Beebe, Jr., University of Delaware
11:20am	AS+SS-ThM11 FIB-TOF Characterization of Organic and Organic/Inorganic Structures David Carr, G.L. Fisher, S.R. Bryan, Physical Electronics, S. Iida, T. Miyayama, ULVAC-PHI, Japan
11:40am	AS+SS-ThM12 Molecular Depth Profiling with a New Hybrid 3D SIMS instrument for Improved Molecular Identification Alexander Pirkl, R. Moellers, H.F. Arlinghaus, ION-TOF GmbH, Germany, N.J. Havercroft, ION-TOF USA, E. Niehuis, ION-TOF GmbH, Germany, A.A. Makarov, S. Horning, Thermo Fisher Scientific, R. Havelund, M.K. Passarelli, A.G. Shard, I.S. Gilmore, National Physical Laboratory, UK
12:00pm	AS+SS-ThM13 3-D Analysis of Binding-Medium Degradation as Related to Renaissance-Era Artwork Zachary Voras, C.M. Goodwin, University of Delaware, J.L. Mass, Rijksmuseum, K.R. DeGhetaldi, Winterthur Museum, T.P. Beebe, Jr., University of Delaware