Paper PS1-ThM5
Multi-zone Equilibrium of ICP Discharge for Plasma Processing. Mechanism of Plasma Heating

Thursday, November 10, 2016, 9:20 am, Room 104C

observations, plasma measurements and even simulations, including multiple species were published

through the years. However theoretical considerations were limited to a case when plasma

equilibrium can be characterized as global. In a real processing plasma this kind of equilibrium is

unstable. Here we analyze more real case when equilibrium consists of at least two areas - one is a

band-like area with self-sustaining plasma, where most of plasma generation occurs is linked on one

side to the induction coil and absorbs all the energy directly from the coil. On the other side

this band is linked to the second - plasma transfer area, which is fed by the energy and particles

escaping from the first area. The second area is also linked to surrounding walls. In a way, this

structure of ICP discharge reminds a glow discharge structure. The first - plasma generating area

functions similar to a cathode fall, and the plasma transfer area - similar to a positive column.

The number of plasma generating zones depends on the number of coils and construction of the coil,

and is usually more than one plasma generating zones are linked to a common plasma transfer zone.

Keywords - Plasma Processing, Inductively coupled plasma, ICP discharge, Plasma Sources