| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS1-ThM |
| Session: | Modeling of Plasmas and Plasma-Surface Interactions |
| Presenter: | James McGugan, Tech-X Corp. |
| Authors: | J.D. McGugan, Tech-X Corp. C.D. Zhou, Tech-X Corp. J.D. Smith, Tech-X UK Ltd. C.M. Roark, Tech-X Corp. A.Y. Pankin, Tech-X Corp. P.H. Stoltz, Tech-X Corp. |
| Correspondent: | Click to Email |
A 2D, axisymmetric model for a cylindrical magnetron is presented. The model is PIC based and performed in the software tool, VSim for Plasma Discharges. The effects of an external feedback circuit are investigated and an IV curve for the device is presented. The sputtering rate and erosion profile are obtained, and the erosion profile is input as an iterative geometry modification. The effects of this non-planar surface are calculated using a second-order cut-cell algorithm within the PIC algorithm. The modifications of the non-planar surface on the sputtering rate and yield are presented. Finally, the results are used to quantitatively predict device performance, longevity, and the atomic layer distribution of sputtered atoms on the target.