| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
| Session PS+TF-WeA |
| Session: | Plasma Deposition and Plasma Assisted ALD |
| Presenter: | Tara Van Surksum, Colorado State University |
| Authors: | T.L. Van Surksum, Colorado State University E.R. Fisher, Colorado State University |
| Correspondent: | Click to Email |
Diamond-like carbon (DLC) films have numerous potential applications because of their appealing mechanical and electronic properties (e.g., hardness, thermal conductivity, and high electrical resistance). Plasma enhanced chemical vapor deposition (PECVD) is a widely used technique in the production of DLC films, but to date, little is known about the underlying molecular-level chemistry involved in DLC plasma processing. In particular, energy partitioning within plasmas used to either produce or modify DLC films is not well understood. The present work focuses on investigating the fundamental chemistry of hydrocarbon plasmas used in DLC film processing as a means of understanding and ultimately controlling film fabrication. Here, we present a more holistic assessment of PECVD system used to create DLC films, including analysis of the gas-phase as well as the resulting materials. This comprehensive evaluation utilizing optical spectroscopy techniques and surface analysis tools (e.g., profilometry, contact angle goniometry, and Fourier transform infrared spectroscopy) is part of a larger effort to elucidate fundamental physical and chemical information on plasma processes that control deposition. For example, developing an understanding of energy partitioning within these plasma systems is a central component of this work as we have employed optical emission spectroscopy and broadband absorption spectroscopy to determine rotational and vibrational temperatures (Trand Tv, respectively) of the CH radical in a variety of hydrocarbon precursor plasma systems. In CH4 plasmas, Tv(CH) ranges from ~3000 to ~5000 K under most plasma conditions, whereas Tr generally reaches values ranging from 1000-2000 K. Both values appear to be correlated with system pressure and applied rf power. These results will also be presented in relationship to the properties of the deposited films. More importantly, data such as these provide valuable insight regarding possible mechanistic details in hydrocarbon plasmas linked to DLC film fabrication and help to unravel these complex systems with and without the presence of a substrate.