| AVS 63rd International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Friday Sessions |
| Session EL+AS+EM+MI+TF-FrM |
| Session: | Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches |
| Presenter: | Pim Muilwijk, TNO Technical Sciences, Netherlands |
| Authors: | P.M. Muilwijk, TNO Technical Sciences, Netherlands N.B. Koster, TNO Technical Sciences, Netherlands F.T. Molkenboer, TNO Technical Sciences, Netherlands E. Sligte, te, TNO Technical Sciences, Netherlands A.F. Deutz, TNO Technical Sciences, Netherlands P. Walle, van der, TNO Technical Sciences, Netherlands |
| Correspondent: | Click to Email |
TNO is realizing EUV Beamline 2 (EBL2), a facility to investigate the effects of Extreme Ultra-Violet (EUV) radiation on surfaces to enable future EUV High Volume Manufacturing (HVM) production. In this facility, samples with sizes up to 152x152x20 mm (6” EUV reticles) can be exposed to EUV radiation of up to 500W equivalent at intermediate focus (IF) under realistic environmental conditions and analyzed by in-situ ellipsometry and XPS. EBL2 consists of EUV source, automated handling system, beam line and an exposure chamber with an in-situ dual wavelength Mueller-matrix imaging ellipsometer.
Light from the dual wavelength light source (405 & 640nm) enters the exposure chamber through a polarizer, configurable retarder and a vacuum window producing a defined polarization state. After reflecting off of the sample, the light exits the exposure chamber through a vacuum window, configurable retarder and polarizer. The sample position is imaged on two camera’s, one for each wavelength. By combining all combinations of 4 polarization illumination states with 4 analyser states the full Mueller matrix of the sample can be recovered.
Calibration is performed in-situ with two insertable polarizers and two different calibration samples. The calibration procedure does not require prior knowledge of the polarizer orientation nor of the calibration samples.
This presentation will focus on the design and realization of the ellipsometer and will also touch upon the process of interpreting the data.
EBL2 will be publicly accessible as a test facility for EUV lithography related research after qualification, which is expected to be finished end of Q1 2017.