| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Invited Paper FEOL Patterning Challenges for Sub 14nm FDSOI Technology Sébastien Barnola, N. Posseme, P. Pimenta-Barros, C. Vizioz, CEA, LETI, MINATEC Campus, France, C. Arvet, ST Microelectronics, France, O. Pollet, A. Sarrazin, CEA, LETI, MINATEC Campus, France, M. Garcia-Barros, ST Microelectronics, France, L. Desvoivres, CEA, LETI, MINATEC Campus, France |
| 9:00am | PS-MoM3 Material and Etch Interaction Comparisons for SIT Patterning John Sporre, IBM Corporation, A. Raley, TEL Technology Center, America, LLC, D. Moreau, STMicroelectronics, M. Sankarapandian, P.K.C. Sripadarao, J. Fullam, M. Breton, R. Chao, S. Kanakasabapathy, IBM Corporation, A. Ko, TEL Technology Center, America, LLC |
| 9:20am | PS-MoM4 Trim Etch for sub-20 nm Technology Guangjun Yang, D. Keller, Y. Rui, R. Benson, A. Schrinsky, Micron Technology |
| 9:40am | PS-MoM5 Laser-Assisted Dry Etch of poly-Si and SiO2 for Semiconductor Processing Jason Peck, G.A. Panici, I.A. Shchelkanov, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 10:00am | PS-MoM6 Spatial Resolution Considerations for Uniformity Improvement by Gas Cluster Ion Beam Etch Joshua LaRose, TEL Technology Center, America, LLC, B. Pfeifer, V. Gizzo, Tokyo Electron, N. Joy, N.M. Russell, TEL Technology Center, America, LLC |
| 10:40am | PS-MoM8 Invited Paper Analysis of Surface Reaction Layers formed by Highly Selective Etching with Pulsed Microwave Plasma Miyako Matsui, Hitachi Ltd., Japan, M. Morimoto, N. Ikeda, T. Ono, Hitachi High-Technologies Corp. |
| 11:20am | PS-MoM10 Improvement of Gate Shoulder Retention and SiN Selectivity over Si in Spacer Process Yohei Ishii, K. Okuma, N. Negishi, J. Manos, Hitachi High Technologies America Inc. |
| 11:40am | PS-MoM11 Advanced Patterning Applications Using High Selectivity Etch Chemistry Nathan Marchack, S.U. Engelmann, E.A. Joseph, R.L. Bruce, H. Miyazoe, E.M. Sikorski, IBM T.J. Watson Research Center, T. Suzuki, M. Nakamura, A. Itou, ZEON Chemicals L.P., H. Matsumoto, Zeon Corporation, Kawasaki, Japan |