| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP3 Optical Emission Spectroscopy of CH3F/CO2 Plasmas and Etching of SiNx and p-Si Qiaowei Lou, S. Kaler, D.J. Economou, V.M. Donnelly, University of Houston |
| PS-TuP5 Simulation and Diagnostic Study on the Large Area Magnetized Inductively Coupled Ar/O2/CF4 Plasma Ho-Jun Lee, E.-J. Son, Y.-G. Kim, Pusan National University, Republic of Korea |
| PS-TuP6 Molecular Dynamics Simulation Study on Polymer Formation during Silicon Oxide (SiO2) and Silicon Nitride (SiN) Etching by Fluoro/Hydrofluorocarbon Plasmas Satoshi Hamaguchi, M. Isobe, K. Miyake, K. Karahashi, Osaka University, Japan, M. Fukasawa, K. Nagahata, T. Tatsumi, Sony Corporation, Japan |
| PS-TuP7 Development of a Compact Microwave Plasma Density Sensor for Processing Plasma Monitoring JinSheng Chiou, W.C. Chen, C.H. Hsieh, K.C. Leou, National Tsing Hua University, Taiwan, Republic of China |
| PS-TuP8 Impact of Magnetic Neutral-Loop Discharge Plasma on Low-k Dielectrics Weiyi Li, S-H. Kim, J. Blatz, University of Wisconsin-Madison, B.H. Moon, Y.M. Sung, Kyungsung University (Korea), S. Banna, AMAT, Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
| PS-TuP9 Characterization and Simulation of a VHF Remote Plasma Source Scott Polak, D. Carter, Advanced Energy Industries, A. Bhoj, A. Roy, ESI US R&D Inc. |
| PS-TuP10 Temporally and Spatially Resolved Optical Emission Spectroscopy of Capacitively Coupled Pulsed Plasmas John Poulose, L.J. Overzet, M.J. Goeckner, University of Texas at Dallas |
| PS-TuP11 Laser-induced Incandescence Diagnostic for In Situ Monitoring of Synhtesis of Nanoparticles in Plasma James Mitrani, B. Stratton, Y. Raitses, Princeton Plasma Physics Laboratory |
| PS-TuP12 Influence of Porosity on Electrical Properties of Low-k Dielectrics Irradiated with Vacuum Ultraviolet Radiation F.A. Choudhury, University of Wisconsin-Madison, J.-F. de Marneffe, M. Baklanov, IMEC, KU Leuven Belgium, Y. Nishi, Stanford University, Leon Shohet, University of Wisconsin-Madison |
| PS-TuP13 Ink Cap to Preserve Nanostructure during Sample Preparation for Electron Microscopy Brian Krist, J.S. Chawla, M. Chandhok, S.R. Cook, H.J. Yoo, Intel Corporation |
| PS-TuP15 Surface Modification to Improve Chemical Resistance of Coatings Gregory Peterson, W.O. Gordon, Edgewood Chemical Biological Center, E.M. Durke, Excet, Inc. |
| PS-TuP16 The Effect of Electron-Molecule Collision Cross Sections on Plasma Models Sebastian Mohr, Quantemol Ltd, UK, J.R. Hamilton, A. Asokan, J.C. Tennyson, University College London, UK |
| PS-TuP17 Development of Microwave-driven 1- and 2-Dimensional Microplasma Arrays and Tests of Atmospheric-Pressure Film Deposition Alan Hoskinson, H.C. Thejaswini, J. Hopwood, Tufts University |
| PS-TuP18 Mechanical Property of Polyurethane Nanocomposite Film with Carbon Nanotubes Functionalized by Atmospheric Dielectric Barrier Discharge D. Ogawa, Keiji Nakamura, Chubu University, Japan |
| PS-TuP20 Development of a Low Cost and Portable Needle Type DBD Jet Operated under Atmospheric Pressure Chieh-Wen Chen, Y.J. Yang, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP21 Development of Low Cost and Flexible Microplasma Generation Devices Operated under Atmospheric Pressure Chih-Ming Wang, T.H. Lin, Y.J. Yang, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP22 A Low Cost and Flexible Microplasma Generation Device to Create Hydrophobic/Hydrophilic Contrast on Nonflat Surfaces Yao-Jhen Yang, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP23 Control of Plasma in Solution Using Bipolar Pulsed Voltage Fei-Hung Huang, C.Y. Chou, H.W. Chang, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP24 The Effect of the Electrode Diameter on the Behavior of Plasmas in Saline Solution Shen-Chieh Lin, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP25 Surface Treatment Using Portable Dielectric Barrier Discharge Device Yao-Yi Kuo, W.S. Zseng, C.M. Wang, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP27 RF Pulsing Technology on Commercial CCP(Capacitively Coupled Plasma) Dielectric Etcher and ICP(Inductively Coupled Plasma) Conductor Etcher. Taeho Shin, SEMES, Republic of Korea |
| PS-TuP28 Plasma Damage Characterization in Backbone Carbon Organosilicate Glass Low-k Films - with Backbone Chains (-Si-R-R-Si-) and (-Si-R-Si-) Haseeb Kazi, R. James, S. Gaddam, J.A. Kelber, University of North Texas |
| PS-TuP29 A Continuous Plasma-Liquid Interface formed by a Laminar Flow Liquid Water Jet and Atmospheric-pressure Microplasma BrittanyPaige Bishop, S. Ghosh, I. Morrison, D. Scherson, R. Akolkar, R.M. Sankaran, Case Western Reserve University |
| PS-TuP30 Anomalous Electron Cross-Field Transport in a Low Pressure Magnetized Plasma For Material Processing Applications Yevgeny Raitses, Princeton Plasma Physics Laboratory |