| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS-TuM1 Invited Paper Directed Irradiation Synthesis: Manipulating Matter in Nanoscale Self-Organized Systems Jean Paul Allain, Z. Koyn, B. Holybee, S. Arias, University of Illinois at Urbana-Champaign |
| 8:40am | PS-TuM3 Contact Resistance Degradation Caused By Plasma Charging of Silicon on Insulator During Contact Etch Todd Bauer, J.F. DiGregorio, R.L. Jarecki Jr., Sandia National Laboratories |
| 9:00am | PS-TuM4 3D Modeling of SiN Etching by Hydrofluorocarbon Plasma Nobuyuki Kuboi, T. Tatsumi, T. Kinoshita, T. Shigetoshi, M. Fukasawa, J. Komachi, H. Ansai, Sony Corporation, Japan |
| 9:20am | PS-TuM5 Study of Plasma-Surface Interaction in HBr/Cl2/O2 ICP Ashutosh Srivastava, University of Houston, T. Ohashi, Hitachi High-Technologies, V.M. Donnelly, University of Houston |
| 9:40am | PS-TuM6 Experimental Evaluation of Ta Film Etching Characteristics by CO+ Ion Irradiation Makoto Satake, Hitachi, Japan, H. Li, K. Karahashi, S. Hamaguchi, Osaka University, Japan |
| 11:00am | PS-TuM10 Study of Hydrofluorocarbon Precursor Parameters for Plasma Etching of ULK Dielectric Chen Li, G.S. Oehrlein, University of Maryland, College Park, R. Gupta, V. Pallem, Air Liquide |
| 11:20am | PS-TuM11 Characteristics of Reactive Ion Etching Processes for ITO and ZnO Hu Li, K. Karahashi, Osaka University, Japan, M. Fukasawa, K. Nagahata, T. Tatsumi, Sony Corporation, Japan, S. Hamaguchi, Osaka University, Japan |
| 11:40am | PS-TuM12 Selective Etch and Functionalization of Coblock Polymers Evgeniya Lock, S.G. Walton, Naval Research Laboratory |
| 12:00pm | PS-TuM13 Dry Etch Process Development for PMMA Removal Selectively to PS for sub-10nm Patterning Aurelien Sarrazin, P. Pimenta-Barros, N. Posseme, S. Barnola, A. Gharbi, R. Tiron, CEA, LETI, MINATEC Campus, France, C. Cardinaud, CNRS-IMN, France |