Paper PS-TuM12
Selective Etch and Functionalization of Coblock Polymers

Tuesday, November 11, 2014, 11:40 am, Room 308

Coblock polymers have been applied as nanotemplates for production of nanocomposites and biomolecules nanoarrays due to their ability to spontaneously form dense periodic spherical, cylindrical, and lamellar domains. The final nanostructure is typically produced after chemical etch or dry plasma-based etch in fluorine containing gas environment. However, systematic studies of the effects of plasma etching of coblock polymers in different gas environments are limited. Furthermore, selective chemical functionalization of one of the blocks, while the other one is etched will enable more robust biomolecules/nanoparticles integration and is of critical importance. In order to achieve nanoscale high resolution etch, a precise control of the plasma/surface interactions is needed.

We have already shown that electron beam-generated plasmas can introduce large range of chemical functionalities in a polymer surfaces and etch polymers with low etch rates [1, 2]. In this work, we will show the ability of these plasmas to achieve nanoscale etch of PS-b-PMMA in different gas environments. In addition, the effect of ion energy (1 to 100 eV) on features definition and etch depth will be evaluated. This work was supported by the Naval Research Laboratory Base Program.

References:

1. E. H. Lock, D. Y. Petrovykh, P. Mack, T. Carney, R. G. White, S. G. Walton and R. F. Fernsler, “Surface composition, chemistry and structure of polystyrene modified by electron-beam-generated plasma”, Langmuir, 26 (11), 8857 (2010).

2. E. H. Lock, S. G. Walton and R. F. Fernsler, ”Physio-chemical modifications of polystyrene and polypropylene surfaces by electron beam-generated plasmas produced in argon”, Plasma Process. Polym. 6 (4), 234 (2009).