| AVS 61st International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Invited Paper Dielectric Etch Challenges and Evolutions Masanobu Honda, Tokyo Electron Miyagi Limited, Japan |
| 9:00am | PS-MoM3 Improving Selectivity for 10nm BEOL Etch Using C5HF7 Gas Robert Bruce, IBM T.J. Watson Research Center, T. Suzuki, M. Nakamura, ZEON Chemicals L.P., A. Itou, G. Matsuura, Zeon Corporation, S.U. Engelmann, N.P. Marchack, E.M. Sikorski, IBM T.J. Watson Research Center, J. Lee, IBM Albany Nanotech Center, E.A. Joseph, IBM T.J. Watson Research Center |
| 9:20am | PS-MoM4 Effect of 147nm Photons on Porous Organo-Silicon Glass Materials and Damage Improvement by Optimized Cu/Low-k Integration Approaches L. Zhang, IMEC, KU Leuven, Belgium, Jean-Francois de Marneffe, IMEC, Belgium, M. Lukaszewicz, Wroclaw University of Technology, Poland, S. Barry-Porter, F. Vajda, Trinity College Dublin, Ireland, Y. Sun, IMEC, Belgium, M.H. Heyne, IMEC, KU Leuven, Belgium, M. Baklanov, IMEC, Belgium |
| 9:40am | PS-MoM5 Non-PFC Plasma Chemistries for Patterning Low-k Dielectric Materials Jack Kun-Chieh Chen, N. Altieri, M. Paine, T. Kim, J.P. Chang, UCLA |
| 10:00am | PS-MoM6 Optimization of the Optical Transmission of Submicron Silicon-on-Insulator Rib Waveguides Marc Fouchier, E. Pargon, CNRS/UJF/CEA-LTM, France, B. Ben Bakir, P. Brianceau, J. Harduin, S. Barnola, P. Grosse, CEA-LETI, France |
| 10:40am | PS-MoM8 Using Post Etch Treatment (PET) to Resolve Poly Residue Defect Issue of Dummy Poly Removal (DPR) in hi-K Metal Gate Processing Chih-Chien Wang, F.Y. Chang, C. Li-Chiang, S.-Y. Lu, United Microelectronics Co., Taiwan, Republic of China, P.-W. Huang, Y.-C. Kao, S.-Y. Cheng, T.-T. Su, Lam Research Corporation |
| 11:00am | PS-MoM9 Sidewall Roughness Characterization of an Advanced Spacer Patterning Process Emmanuel Dupuy, M. Fouchier, E. Pargon, CNRS-LTM, France, J. Pradelles, CEA-Léti, France, H. Grampeix, CEA-LETI, France, P. Pimenta-Barros, S. Barnola, CEA, LETI, France, O. Joubert, LTM - CEA/LETI, France |
| 11:20am | PS-MoM10 Improving Pattern Fidelity for Selective Etch Processes Nathan Marchack, S.U. Engelmann, E.A. Joseph, R.L. Bruce, H. Miyazoe, E.M. Sikorski, IBM T.J. Watson Research Center, T. Suzuki, M. Nakamura, ZEON Chemicals L.P., A. Itou, H. Matsumoto, Zeon Corporation |