| AVS 61st International Symposium & Exhibition | |
| Materials Characterization in the Semiconductor Industry Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| MC-TuP1 Volumetric and Surface Chemistry of SF6/C4F8/Ar Gas Mixture Robert Bates, M.J. Goeckner, P.L.S. Thamban, L.J. Overzet, University of Texas at Dallas |
| MC-TuP3 SIMS Measurements of Impurities and Alloying Elements in Cu Films used for BEOL Processes Steven Novak, T. Laursen, SUNY College of Nanoscale Science and Engineering, M. Rizzolo, IBM Albany Nanotech Center, B. O'brien, SUNY College of Nanoscale Science and Engineering |
| MC-TuP4 Growth and Characterization of β-Tungsten Films Avyaya Jayanthinarasimham, M. Medikonda, A. Matsubayashi, A.C. Diebold, R. Matyi, V.P. LaBella, SUNY Albany, P. Khare, H. Chong, College of Nanoscale Science and Engineering |
| MC-TuP6 Some Experience in Characterizing Thin Films on Next Generation 450mm Wafer with Spectroscopic Ellipsometry Richard Sun, N. Sun, Angstrom Sun Technologies Inc. |
| MC-TuP7 The Effect of Aberration Coefficients on Phase Shift in Electronic Optics Chien-Nan Hsiao, J.S. Kao, F.Z. Chen, J.L.A. Yeh, ITRC, NARL, Taiwan, Republic of China |
| MC-TuP8 Modification of Density of States in Iron Chloride Intercalated Epitaxial Graphene with Electric Bias Taurean Groover, M.D. Williams, Clark Atlanta University |