| AVS 60th International Symposium and Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+AS+BI+EM+SE+SS-WeA1 Invited Paper Enhanced Multiphoton Processes for Molecule Localization on Plasmonic Nanostructures J. Shumaker-Parry, University of Utah |
| 2:40pm | TF+AS+BI+EM+SE+SS-WeA3 A Path towards Single-Electron Devices P. Campbell, University of Texas at Dallas, L. Caillard, O. Pluchery, University of Pierre and Marie Curie, France, Y.J. Chabal, University of Texas at Dallas |
| 3:20pm | TF+AS+BI+EM+SE+SS-WeA5 Chemical and Electronic Interface Formation between a Monolayer and Cobalt S. Pookpanratana, H.-J. Jang, L.K. Lydecker, C.A. Richter, C.A. Hacker, National Institute of Standards and Technology (NIST) |
| 4:00pm | TF+AS+BI+EM+SE+SS-WeA7 Stability of the Molecule-Substrate Interface in SAMs Probed by SIMS – Experiments and Simulations J.W. Ossowski, J. Rysz, D. Maciazek, Jagiellonian University, Poland, M. Krawiec, Maria Curie-Sklodowska University, Poland, Z. Postawa, Jagiellonian University, Poland, A. Terfort, Goethe University, Germany, P. Cyganik, Jagiellonian University, Poland |
| 4:20pm | TF+AS+BI+EM+SE+SS-WeA8 Controlled Modification of Protein-Repelling Monomolecular Films by Ultraviolet Light: The Effect of Wavelength and Implications for Lithography Y.L. Jeyachandran, University of Heidelberg, Germany, A. Terfort, Frankfurt University, Germany, M. Zharnikov, University of Heidelberg, Germany |
| 4:40pm | TF+AS+BI+EM+SE+SS-WeA9 The 2D Self-Assembly of Strongly Dipolar Molecules A. Enders, D. Kunkel, S. Beniwal, P.A. Dowben, University of Nebraska Lincoln, S. Simpson, E. Zurek, State University of New York at Buffalo |
| 5:00pm | TF+AS+BI+EM+SE+SS-WeA10 Quasicrystalline Ordering in Small-Molecule Self-Assembly N.A. Wasio, R.C. Quardokus, R.P. Forrest, C.S. Lent, S.A. Corcelli, J.A. Christie, K.W. Henderson, S.A. Kandel, University of Notre Dame |
| 5:20pm | TF+AS+BI+EM+SE+SS-WeA11 Unexpected Behaviour of Liquid Wetting at the Limit of Small-Scale Surface Topography J. Knauf, Advanced Molecular Films GmbH and RWTH Aachen University, Germany, L. Reddemann, Advanced Molecular Films GmbH and Universität zu Köln, Germany, A. Böker, RWTH Aachen University and DWI an der RWTH Aachen e.V., Germany, K. Reihs, Advanced Molecular Films GmbH, Germany |
| 5:40pm | TF+AS+BI+EM+SE+SS-WeA12 The Balance between Transparency and Roughness on a Superhydrophobic Coating C. Wang, A. Wu, R. Lamb, University of Melbourne, Australia |