| AVS 60th International Symposium and Exhibition | |
| Synchrotron Analysis Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SA+AS+MG+SS-TuA1 Invited Paper Past and Present of Synchrotron Radiation, from Hard X-ray Photoemission to Soft X-ray and Back P. Pianetta, Stanford University |
| 2:40pm | SA+AS+MG+SS-TuA3 Practical use of Photoemission with Synchrotron Radiation in Nanotechnology: From Soft to Hard X-rays O.J. Renault, E. Martinez, CEA-LETI, France, N. Barrett, Cea Dsm Iramis Spcsi, France |
| 3:00pm | SA+AS+MG+SS-TuA4 Effective Attenuation Length for Titanium Nitride, Hafnium Oxide, Silicon, Silicon Dioxide, Lanthanum Lutetium Oxide, Lanthanum Calcium Manganite, and Gold from 1 keV up to 15 keV J. Rubio-Zuazo, G.R. Castro, SpLine Spanisch CRG beamline at the European Synchrotron Radiation Facility, France |
| 4:00pm | SA+AS+MG+SS-TuA7 Invited Paper Hard X-ray Photoelectron Spectroscopy (HAXPES) Investigations of Electronic Materials and Interfaces J.C. Woicik, National Institute of Standards and Technology (NIST) |
| 4:40pm | SA+AS+MG+SS-TuA9 HAXPES Study of Full High-κ /Metal Gate Stacks Deposited on Ge Substrates C. Fleischmann, I. Kalpyris, T. Conard, C. Adelmann, S. Sioncke, IMEC, Belgium, J.P. Rueff, J. Ablett, Synchrotron SOLEIL, France, W. Vandervorst, IMEC, KU Leuven, Belgium |
| 5:00pm | SA+AS+MG+SS-TuA10 X-ray Absorption Spectroscopy of Magnetic/Ferroelectric Complex Oxide Interfaces M.B. Holcomb, J. Zhou, D. Chen, West Virginia University, C. Jenkins, M.A. Marcus, Lawrence Berkeley National Laboratory, Y.-H. Chu, National Chiao Tung University, Taiwan, Republic of China |
| 5:20pm | SA+AS+MG+SS-TuA11 Invited Paper Local-Structure Determination Using Combined Fitting of EXAFS and Neutron Total Scattering Data I. Levin, National Institute of Standards and Technology |