| AVS 60th International Symposium and Exhibition | |
| Nanometer-scale Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | NS+BI+EM-WeA2 Tunneling Electron Induced Adsorption of Copper Phthalocyanine on the Cu(111) Surface T. Stock, J. Nogami, University of Toronto, Canada |
| 2:40pm | NS+BI+EM-WeA3 STM Study of Pyramid Structures on Ge(110) Formed by Argon Ion Sputtering M.S. van Zijll, S. MacIntyre, S. Chiang, University of California, Davis |
| 3:00pm | NS+BI+EM-WeA4 Enhanced Electrical Conductivity by Au Nanoparticle Islands Deposited from Solution F. Jiang, A.J. Muscat, University of Arizona |
| 4:00pm | NS+BI+EM-WeA7 Invited Paper Nanoimprinted Amorphous Metals for Energy Applications J. Schroers, A.D. Taylor, R.C. Sekol, Yale University, G. Doubek, IPEN, Brazil, G. Kumar, Texas Tech University, M. Carmo, Forschungszentrum Jülich GmbH, Germany, F. Gittleson, N. Hardesty-Dyck, Yale University, S. Mukherjee, University of North Texas |
| 4:40pm | NS+BI+EM-WeA9 Submicron Cylindrical Gratings for Rotation Sensors J. Laukkanen, University of Eastern Finland, S. Tonchev, Y. Jourlin, S. Reynaud, CNRS, France, H. Hirshy, S.G. Scholz, Cardiff University, UK, O. Parriaux, CNRS, France |
| 5:00pm | NS+BI+EM-WeA10 DNA Assembly on Nanopatterns Created by Electron Beam Lithography A.K. Pradhan, Norfolk State University |
| 5:20pm | NS+BI+EM-WeA11 Organic Resist Materials for sub-20 nm Patterning: Robust Materials Enabled by Crosslinking Based Designs C. Henderson, R. Lawson, A. Cheshmekhani, Georgia Institute of Technology |