AVS 60th International Symposium and Exhibition
    Nanometer-scale Science and Technology Wednesday Sessions
       Session NS+BI+EM-WeA

Paper NS+BI+EM-WeA10
DNA Assembly on Nanopatterns Created by Electron Beam Lithography

Wednesday, October 30, 2013, 5:00 pm, Room 203 B

Session: Nanopatterning and Nanolithography
Presenter: A.K. Pradhan, Norfolk State University
Correspondent: Click to Email

A major goal of nanotechnology is to couple the self-assembly (SAMs) of molecular nanostructures with conventional micro as well as nanofabrication, for instance the so-called bottom-up and top-down fabrication methods would enable us to register and recognize individual molecular nanostructures in order to integrate them electronically into functional devices. However, the integration of top-down (lithographic pattern) with bottom-up (functionalizing with synthetic chemical) approaches remains a central challenge in nanofabrication. We demonstrate that the selective self-assembly of DNA nanostructures can happen on electron beam lithographically patterned surfaces at lower energy. The fluorescent dye coupled amine modified DNA nanostructures were selectively attached to the patterned glass substrates. The optimized binding interaction between self-assembled DNA nanostructures occurred preferably at lower beam energy due to the attractive energy between the pattern and DNAs . Patterns containing self-assembled DNA molecules with dimensions as small as 2 nm in height and 68 nm in width have been successfully demonstrated. The periodicity in DNA self-assembly was observed. This technology of combination of “top-down” fabrication and “bottom-up” self-assembly may find use wherever there is a need to attach self-assembled DNA molecules in a nanometer scale patterned surface for various applications.