| AVS 60th International Symposium and Exhibition | |
| Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS+BI-MoM1 Combining Gas Cluster Ion Beam (GCIB) and Angle-Resolved XPS (ARXPS) Depth-Profiling P. Cumpson, A. Barlow, N. Sano, J. Portoles, Newcastle University, UK |
| 8:40am | AS+BI-MoM2 XPS Analysis of Oxygen Plasma Modified Polyethylene Surfaces S.S. Alnabulsi, Physical Electronics Inc., N. De Geyter, R. Morent, Ghent University, Belgium, J.F. Moulder, Physical Electronics Inc. |
| 9:00am | AS+BI-MoM3 XPS Valence Band Profiling of Polymer Mixtures with Argon Cluster Ions P. Mack, A.E. Wright, Thermo Fisher Scientific, UK |
| 9:20am | AS+BI-MoM4 Successful XPS Sputter Depth Profiling of Organic Materials Using Massive Argon Cluster Ions S.J. Hutton, Kratos Analytical Limited, UK, J. Walton, The University of Manchester, UK, W. Boxford, C.J. Blomfield, J.D.P. Counsell, S.C. Page, Kratos Analytical Limited, UK |
| 9:40am | AS+BI-MoM5 3D Characterization of Multi-Layer Polymer Films by XPS and TOF-SIMS S. Iida, T. Miyayama, ULVAC-PHI, Inc., Japan, G.L. Fisher, J.S. Hammond, S.R. Bryan, Physical Electronics Inc. |
| 10:00am | AS+BI-MoM6 In Situ TOF-SIMS and SFM Measurements Providing Real 3D Chemical Information E. Niehuis, S. Kayser, R. Möllers, ION-TOF GmbH, Germany, L. Bernard, H.-J. Hug, EMPA, Switzerland, N. Havercroft, ION-TOF USA, Inc., R. Dianoux, A. Scheidemann, NanoScan AG, Switzerland |
| 10:40am | AS+BI-MoM8 Time of Flight Secondary Ion Mass Spectroscopy (ToF SIMS) Analysis of Stress Tolerant Polymer (STP) in GenGard Corrosion Inhibitors G. Zorn, M. Karadge, M.M. Morra, GE Global Research, J. Davis, C.C. Pierce, J.I. Melzer, GE Power & Water |
| 11:00am | AS+BI-MoM9 Argon Gas Cluster Beam Etching of Organic Contaminants on Graphene and HOPG BJ. Tyler, A.J. Pollard, I.S. Gilmore, National Physical Laboratory, UK |
| 11:20am | AS+BI-MoM10 Invited Paper Why is Low Energy Cesium so Efficient for Depth-profiling Organics? L. Houssiau, University of Namur, Belgium |