| AVS 60th International Symposium and Exhibition | |
| Applied Surface Science | Monday Sessions |
| Session AS+BI-MoM |
| Session: | Organic Depth Profiling |
| Presenter: | S.J. Hutton, Kratos Analytical Limited, UK |
| Authors: | S.J. Hutton, Kratos Analytical Limited, UK J. Walton, The University of Manchester, UK W. Boxford, Kratos Analytical Limited, UK C.J. Blomfield, Kratos Analytical Limited, UK J.D.P. Counsell, Kratos Analytical Limited, UK S.C. Page, Kratos Analytical Limited, UK |
| Correspondent: | Click to Email |
Several XPS vendors currently offer massive Argon gas cluster ion sources as accessories for sputter depth profiling of organic materials. These sources utilise Argon cluster ions formed via adiabatic isentropic expansion of Argon gas into a vacuum followed by subsequent electron impact ionisation and cluster size selection. In ideal cases the aforementioned massive cluster ions efficiently sputter the surface of organic materials revealing undamaged subsurface structure for analysis.
Advanced software controlled ion sources and flexible sample handing equipment allow a wide range of experimental conditions to be routinely employed during sputter depth profiling with these massive Argon clusters. In this study we investigate these parameters including: incident ion energy; cluster size distribution; ion angle of incidence; and sample condition (temperature, rotation). A range of organic materials are analysed and optimum sputter depth profiling conditions determined.