| AVS 59th Annual International Symposium and Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 9:00am | TF-MoM3 Atomic Layer Deposition Films as Diffusion Barriers for Silver Artifacts A.E. Marquardt, University of Maryland, E. Breitung, E-Squared Art Conservation Science, G. Gates, T. Drayman-Weisser, The Walters Art Museum, G.W. Rubloff, R.J. Phaneuf, University of Maryland |
| 9:20am | TF-MoM4 Quasi-ALD for Deposition of a Water Resistive Barrier Layer and Prevent Electronic Devices from Water Shock V. Gupta, M.R. Linford, Brigham Young University |
| 9:40am | TF-MoM5 Invited Paper Atomic Layer Deposition for Astronomy and Space Applications F. Greer, Jet Propulsion Laboratory/California Institute of Technology |
| 10:40am | TF-MoM8 ALD-Enabled Pt/HfO2/Ti and Pt/TiO2/Ti Tunneling Diodes with Enhanced Tunneling Characteristic O. Ajayi, G. Mumcu, J. Wang, University of South Florida |
| 11:00am | TF-MoM9 Uniform Adsorption of Ligand Free Ag Nanoparticles onto TiO2 Thin Films Deposited by Atomic Layer Deposition J.C. Halbur, J.S. Jur, North Carolina State University |
| 11:20am | TF-MoM10 Alloy Films Grown Using Al2O3 ALD and Alucone MLD: Critical Tensile Strains, Water Vapor Transmission Rates and Compliant Interlayers S.H. Jen, B.H. Lee, S.M. George, University of Colorado, Boulder, P.F. Carcia, R.S. McLean, DuPont Central Research and Development |