Future UV, X-ray, infrared, and sub-millimeter telescopes and spectrometers have the potential to revolutionize our understanding of the formation and habitability of the modern universe. Star formation, dark energy, and the composition of the intergalactic medium are only some of the key scientific topics that can be addressed by UV astronomy and astrophysics. Infrared astronomy enables the hunt for new planets and stars, even through clouds of interstellar dust, while sub-millimeter astronomy can probe the fine structure of the cosmic microwave background, giving glimpses into the early universe immediately following the Big Bang. While existing technology has allowed us to probe deep into the universe, materials or fabrication challenges still limit the sensitivity and capability of the detectors and instruments used in these applications. In this talk, we will first discuss, in general, how the precision and control afforded by atomic layer deposition can be used to substantially increase the capability of astronomers to make new discoveries. Then, we will focus on specific cases to show the impact of ALD films on the coating, passivation, and fabrication of UV, infrared, and submillimeter detectors, respectively. For example, atomic layer deposition coatings utilized in UV instruments, once fully optimized, can yield as much as a 100X increase in signal to noise ratio over conventional technology. Here, we will demonstrate how small changes in nucleation and growth conditions of ALD fluorides, oxides, and transition metal nitrides have a significant effect on the performance of these detectors and other instrument components, even for films with comparable indices of refraction and resistivity. We will also discuss the novel ALD chemistries that we have pursued, e.g. for MgF2 deposition, in order to achieve reliable processes. Finally, this presentation will detail the unique surface engineering approaches such as the combination of atomic layer deposition and MBE, demonstrating the advantages that are obtained by achieving atomic level precision at key steps in detector fabrication processes.