AVS 59th Annual International Symposium and Exhibition
    Thin Film Monday Sessions
       Session TF-MoM

Paper TF-MoM9
Uniform Adsorption of Ligand Free Ag Nanoparticles onto TiO2 Thin Films Deposited by Atomic Layer Deposition

Monday, October 29, 2012, 11:00 am, Room 11

Session: ALD Enabled Applications
Presenter: J.C. Halbur, North Carolina State University
Authors: J.C. Halbur, North Carolina State University
J.S. Jur, North Carolina State University
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Nanoparticle modification of inorganic thin films, such as TiO2 or Al2O3, represents a method to enhance or alter the catalytic, antimicrobial, or responsive behaviors of a material. The use of nanoparticle inks for application is challenging, as the nanoparticles tend to be stabilized using surfactants or other molecules during the synthesis process, and these ligands can interfere with or prevent nanoparticle adsorption onto the oxide. This work shows the efficacy to attach ligand-free Ag nanoparticles onto TiO2 surfaces formed by atomic layer deposition (ALD). Sonochemical synthesis is used to create Ag NPs of 14-20 nm diameter in an aqueous solution at room temperature without the need for additives such as stabilizing agents. After ALD of TiO2 thin films onto polymer substrates, a facile dip coating process at ambient conditions results in the uniform decoration of the ligand free Ag nanoparticles on the TiO2 surface. The efficiency of nanoparticle adsorption is examined by TEM and EDS. Finally, the photocatalytic degradation of methylene blue is used to assess the photocatalytic efficiency of the fiber based composite.