| AVS 59th Annual International Symposium and Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+EN-MoA1 Invited Paper Atomic Layer Deposition for the Synthesis of Nanostructured Catalysts J.W. Elam, C. Marshall, Argonne National Lab, E. Stach, F. Ribeiro, Purdue Univ., J. Greeley, Argonne National Lab, J. Notestein, K. Poeppelmeier, Northwestern Univ., L. Curtiss, Argonne National Lab, M. Kung, P.C. Stair, Northwestern Univ., L. Winans, Argonne National Lab, S. Nguyen, Northwestern Univ. |
| 2:40pm | TF+EN-MoA3 Using Metalcone Films Grown by Molecular Layer Deposition to Form Conducting Metal Oxide-Carbon Composite Films A. Abdulagatov, K. Terauds, J. Travis, A. Cavanagh, R. Raj, CU Boulder, S.M. George, University of Colorado, Boulder |
| 3:00pm | TF+EN-MoA4 In Situ Growth Study and Material Characterization of Plasma-Assisted Atomic Layer Deposition of Palladium M.J. Weber, A.J.M. Mackus, M.A. Verheijen, N. Leick-Marius, A. Bol, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 3:40pm | TF+EN-MoA6 ALD-enabled Nanostructures for High Rate Li-ion Storage X. Chen, H. Zhu, L. Hu, G.W. Rubloff, University of Maryland |
| 4:00pm | TF+EN-MoA7 Enhancement of the Heat Recovery Mechanism in Infrared Photovoltaic Devices Promoted by Thin Planar ALD Oxide Films A.J. Vincent-Johnson, H.S. Mann, Y. Schwab, James Madison University, A.E. Masters, Custom Thermoelectrics Inc., X. Hu, G. Scarel, James Madison University |
| 4:20pm | TF+EN-MoA8 Ultra-thin TiO2 Blocking Layer by Atomic Layer Deposition for Dye-Sensitized Solar Cells D.H. Kim, M. Woodroof, K.M. Lee, B. Kalanyan, G.N. Parsons, North Carolina State University |