Paper TF+EN-MoA3
Using Metalcone Films Grown by Molecular Layer Deposition to Form Conducting Metal Oxide-Carbon Composite Films

Monday, October 29, 2012, 2:40 pm, Room 11

Metalcone films grown using molecular layer deposition (MLD) techniques with metal and organic precursors are metal alkoxide polymers. These hybrid organic-inorganic films can serve as precursors to conducting metal oxide-carbon composite films. In this study, titanicone MLD films were deposited by sequential, self-limiting exposures of TiCl₄ and glycerol at 150°C. These films were then annealed in argon at temperatures ranging from 500 to 1200 °C. Under argon, the hydrogen is removed from the hybrid organic-inorganic titanicone films and the carbon remains. Raman spectroscopy measurements showed the progressive growth and sharpening of the D and G signature peaks for graphitic carbon after annealing from 600 to 900 °C. The sheet resistance of the annealed films was also found to progressively decrease with increasing annealing temperature. X-ray photoelectron spectroscopy depth profiling confirmed the presence of carbon throughout the annealed film. X-ray diffraction measurements also observed the formation of rutile TiO₂ diffraction peaks. The annealing of metalcone MLD films in argon is a general method to deposit metal oxide-carbon composite films. Conducting metal oxide-carbon composite films are desirable because many electrochemically important metal oxides have low electrical conductivities. The metal oxide-carbon composite films with graphitic carbon have much higher electrical conductivities that will enable their electrochemical application for Li ion batteries and pseudocapacitance supercapacitors.