Paper TF+EN-MoA7
Enhancement of the Heat Recovery Mechanism in Infrared Photovoltaic Devices Promoted by Thin Planar ALD Oxide Films
Monday, October 29, 2012, 4:00 pm, Room 11
| Session: |
ALD for Energy |
| Presenter: |
G. Scarel, James Madison University |
| Authors: |
A.J. Vincent-Johnson, James Madison University
H.S. Mann, James Madison University
Y. Schwab, James Madison University
A.E. Masters, Custom Thermoelectrics Inc.
X. Hu, James Madison University
G. Scarel, James Madison University
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| Correspondent: |
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Infrared photovoltaic devices absorb infrared radiation and transform it into electricity through the heat recovery mechanism [1,2]. In thin planar oxide films, the mechanism is mediated by the excitation of radiative polaritons, as shown by investigations carried out immediately after beginning the exposition to infrared radiation [1,2]. Here we present the results of our investigation on the evolution of the heat recovery mechanism; and the electricity production over time through illumination by infrared radiation. We compare the results on systems including atomic layer deposited (ALD) Al2O3, Al foil, and the bare thermoelectric power generator used for the detection of the heat recovery mechanism. We show that ALD oxide films promote the largest amount of electricity production under long term exposition to both polarized and non-polarized infrared radiation. [1] A.J. Vincent-Johnson, K.A. Vasquez, J.E. Bridstrup, A.E. Masters, X. Hu, and G. Scarel, Appl. Phys. Lett. 99, 131901 (2011).
[2] A.J. Vincent-Johnson, A.E. Masters, X. Hu, and G. Scarel. Submitted.