| AVS 59th Annual International Symposium and Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| SE-TuP1 Analysis of the Physical Damage during HBr/O2/Ar Gate Etching using Various Pulsed Plasmas K.Y. Jeon, J.Y. Lee, G.J. Min, Samsung Electronics Co. Ltd., Republic of Korea |
| SE-TuP2 Deposition of Hard SiOC(− H) Films by Atmospheric Pressure Plasma Enhanced CVD Method M. Noborisaka, R. Horikoshi, A. Shirakura, T. Suzuki, Keio University, Japan |
| SE-TuP3 Thermal Transport at Metal-Carbon Interfaces J.J. Gengler, Spectral Enegies LLC/Air Force Research Laboratory, S.V. Shenogin, UES Inc./Air Force Research Laboratory, A.A. Voevodin, A.K. Roy, C. Muratore, Air Force Research Laboratory |
| SE-TuP4 Multilayer on a Staircase Substrate for Hard X-ray Gratings C. Liu, Argonne National Laboratory, S. Lynch, E. Bennett, A. Gomella, National Institutes of Health, L. Assoufid, Argonne National Laboratory, H. Wen, National Institutes of Health |