| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-ThM1 Invited Paper New Approaches for Overcoming Current Issues of Plasma Sputtering Process during Organic Based Micro-Electronic Device Fabrication : Room Temperature & Plasma Damage Free M. Hong, Korea University |
| 8:40am | PS2-ThM3 Novel Inward Plasma Etching System for Failure Analysis in Nano-Scale Semiconductor Devices T. Shimizu, T. Horie, Y. Naitoh, AIST, Japan, S. Takahashi, C. Iwase, Y. Shirayama, S. Yokosuka, K. Kashimura, S. Shimbori, H. Tokumoto, Sanyu Co. Ltd., Japan |
| 9:00am | PS2-ThM4 Effect of Open Area Ratio and Pattern Structure on Fluctuations in Critical Dimension and Si Recess N. Kuboi, T. Tatsumi, M. Fukasawa, J. Komachi, T. Kinoshita, H. Ansai, H. Miwa, Sony Corporation, Japan |
| 9:20am | PS2-ThM5 Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN) R. Kometani, S. Chen, J. Park, J. Cao, Y. Lu, K. Ishikawa, K. Takeda, H. Kondo, H. Amano, M. Sekine, M. Hori, Nagoya University, Japan |
| 10:40am | PS2-ThM9 Theoretical Calculation of Neutralization Efficiency of Positive and Negative Chlorine Ions with Consideration of Excited States S. Ohtsuka, N. Watanabe, Mizuho Information & Research Institute, Inc., Japan, T. Kubota, Tohoku University, Japan, T. Iwasaki, Y. Iriye, K. Ono, Mizuho Information & Research Institute, Inc., Japan, S. Samukawa, Tohoku University, Japan |
| 11:00am | PS2-ThM10 High-aspect Ratio and Diameter Controlled GaAs/AlGaAs Nano-Pillar Fabrication using Defect-free Neutral Beam Etching and Bio-template Process Y. Tamura, M. Igarashi, M.E. Fauzi, W. Hu, Tohoku University, Japan, I. Yamashita, Nara Institute of Science and Technology, Japan, S. Samukawa, Tohoku University, Japan |
| 11:20am | PS2-ThM11 3-Dimensional and Defect-free Neutral Beam Etching for MEMS Applications Y. Yanagisawa, Tohoku University, Japan, T. Kubota, Tohoku University and BEANS Project, Japan, B. Altansukh, Tohoku University, Japan, K. Miwa, BEANS Project, Japan, S. Samukawa, Tohoku University and BEANS Project, Japan |