| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS2-ThM |
| Session: | Low Damage Processing |
| Presenter: | S. Ohtsuka, Mizuho Information & Research Institute, Inc., Japan |
| Authors: | S. Ohtsuka, Mizuho Information & Research Institute, Inc., Japan N. Watanabe, Mizuho Information & Research Institute, Inc., Japan T. Kubota, Tohoku University, Japan T. Iwasaki, Mizuho Information & Research Institute, Inc., Japan Y. Iriye, Mizuho Information & Research Institute, Inc., Japan K. Ono, Mizuho Information & Research Institute, Inc., Japan S. Samukawa, Tohoku University, Japan |
| Correspondent: | Click to Email |